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| K. Shinkai, M. Hashimoto, and T. Onoye, "A Gate-Delay Model Focusing on Current Fluctuation Over Wide Range of Process-Voltage-Temperature Variations," Integration, the VLSI Journal, 46(4), pp. 345--358, September 2013. | |
| ID | 721 |
| 分類 | 論文誌 |
| タグ | |
| 表題 (title) |
A Gate-Delay Model Focusing on Current Fluctuation Over Wide Range of Process-Voltage-Temperature Variations |
| 表題 (英文) |
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| 著者名 (author) |
K. Shinkai,M. Hashimoto,T. Onoye |
| 英文著者名 (author) |
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| キー (key) |
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| 定期刊行物名 (journal) |
Integration, the VLSI Journal |
| 定期刊行物名 (英文) |
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| 巻数 (volume) |
46 |
| 号数 (number) |
4 |
| ページ範囲 (pages) |
345--358 |
| 刊行月 (month) |
9 |
| 出版年 (year) |
2013 |
| Impact Factor (JCR) |
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| URL |
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| 付加情報 (note) |
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| 注釈 (annote) |
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| 内容梗概 (abstract) |
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| 論文電子ファイル | 利用できません． |
| BiBTeXエントリ |
@article{id721,
title = {A Gate-Delay Model Focusing on Current Fluctuation over Wide Range of Process-Voltage-Temperature Variations},
author = {K. Shinkai and M. Hashimoto and T. Onoye},
journal = {Integration, the VLSI Journal},
volume = {46},
number = {4},
pages = {345--358},
month = {9},
year = {2013},
}
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