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| R. Harada, Y. Mitsuyama, M. Hashimoto, and T. Onoye, "Impact of NBTI-Induced Pulse-Width Modulation on SET Pulse-Width Measurement," IEEE Transactions on Nuclear Science, 60(4), pp. 2630--2634, August 2013. | |
| ID | 658 |
| 分類 | 論文誌 |
| タグ | |
| 表題 (title) |
Impact of NBTI-Induced Pulse-Width Modulation on SET Pulse-Width Measurement |
| 表題 (英文) |
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| 著者名 (author) |
R. Harada,Y. Mitsuyama,M. Hashimoto,T. Onoye |
| 英文著者名 (author) |
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| キー (key) |
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| 定期刊行物名 (journal) |
IEEE Transactions on Nuclear Science |
| 定期刊行物名 (英文) |
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| 巻数 (volume) |
60 |
| 号数 (number) |
4 |
| ページ範囲 (pages) |
2630--2634 |
| 刊行月 (month) |
8 |
| 出版年 (year) |
2013 |
| Impact Factor (JCR) |
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| URL |
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| 付加情報 (note) |
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| 注釈 (annote) |
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| 内容梗概 (abstract) |
This paper gives an explanation that SET pulse-width modulation in bulk CMOS devices happens due to negative bias temperature instability (NBTI). To investigate this, we propose and implement a stress adjustable pulse-width measurement circuit. Measurement results of test chips fabricated in a 65nm bulk CMOS process clearly show that pulse-width broadening and shrinking depend on the condition of static and dynamic stress before the pulse propagation. The measured dependency of pulse-width modulation on supply voltage is well correlated with that of NBTI model. We also point out that soft error rate computed from SET pulse-width distribution measured under static stress is pessimistic. |
| 論文電子ファイル | 利用できません． |
| BiBTeXエントリ |
@article{id658,
title = {Impact of {NBTI}-Induced Pulse-Width Modulation on {SET} Pulse-Width Measurement},
author = {R. Harada and Y. Mitsuyama and M. Hashimoto and T. Onoye},
journal = {IEEE Transactions on Nuclear Science},
volume = {60},
number = {4},
pages = {2630--2634},
month = {8},
year = {2013},
}
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