尾上研究室 研究業績一覧: D. Fukuda, K. Watanabe, Y. Kanazawa, and M. Hashimoto, Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-The-Fly Etching Process Modification, July 2015.
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D. Fukuda, K. Watanabe, Y. Kanazawa, and M. Hashimoto, "Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-The-Fly Etching Process Modification," IEICE Trans. Fundamentals of Electronics Communications and Computer Sciences, E98-A(7), pp. 1467--1474, July 2015.
ID 807
分類 論文誌
タグ
表題 (title) Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-The-Fly Etching Process Modification
表題 (英文)
著者名 (author) D. Fukuda,K. Watanabe,Y. Kanazawa,M. Hashimoto
英文著者名 (author)
キー (key)
定期刊行物名 (journal) IEICE Trans. Fundamentals of Electronics Communications and Computer Sciences
定期刊行物名 (英文)
巻数 (volume) E98-A
号数 (number) 7
ページ範囲 (pages) 1467--1474
刊行月 (month) 7
出版年 (year) 2015
Impact Factor (JCR)
URL
付加情報 (note)
注釈 (annote)
内容梗概 (abstract)
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BiBTeXエントリ
@article{id807,
         title = {Modeling the Effect of Global Layout Pattern on Wire Width Variation for On-the-Fly Etching Process Modification},
        author = {D. Fukuda and K. Watanabe and Y. Kanazawa and M. Hashimoto},
       journal = {IEICE Trans. Fundamentals of Electronics Communications and Computer Sciences},
        volume = {E98-A},
        number = {7},
         pages = {1467--1474},
         month = {7},
          year = {2015},
}
  

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