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分類 論文誌
著者名 (author) K. Shinkai,M. Hashimoto,T. Onoye
英文著者名 (author)
キー (key)
表題 (title) A Gate-Delay Model Focusing on Current Fluctuation over Wide Range of Process-Voltage-Temperature Variations
表題 (英文)
定期刊行物名 (journal) Integration, the VLSI Journal
定期刊行物名 (英文)
巻数 (volume) 46
号数 (number) 4
ページ範囲 (pages) 345--358
刊行月 (month) September
出版年 (year) 2013
付加情報 (note)
注釈 (annote)
内容梗概 (abstract)
論文電子ファイル Not available.


[0-154]  K. Shinkai, M. Hashimoto, and T. Onoye, ``A Gate-Delay Model Focusing on Current Fluctuation Over Wide Range of Process-Voltage-Temperature Variations,'' Integration, the VLSI Journal, vol. 46, no. 4, pp. 345--358, September 2013.

@article{0_154,
    author = {K. Shinkai and M. Hashimoto and T. Onoye},
    author_e = {},
    title = {A Gate-Delay Model Focusing on Current Fluctuation over Wide Range
    of Process-Voltage-Temperature Variations},
    title_e = {},
    journal = {Integration, the VLSI Journal},
    journal_e = {},
    volume = {46},
    number = {4},
    pages = {345--358},
    month = {September},
    year = {2013},
    note = {},
    annote = {}
}

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