論文誌

[1] T. Kanamoto, Y. Ogasahara, K. Natsume, K. Yamaguchi, H. Amishiro, T. Watanabe, and M. Hashimoto, "Impact of Well Edge Proximity Effect on Timing," IEICE Trans. on Fundamentals of Electronics, Communications and Computer Sciences, volume E91-A, number 12, pages 3461-3464, December 2008.

[2] K. Kawamoto, H. Yamaguchi, H. Himi, S. Fujino, and I. Shirakawa, "A 200 V CMOS SOI IC with Field-Plate Trench Isolation for EL Displays," IEICE Trans. Electron, volume E84-C, number 2, pages 260--266, February 2001.

国際会議

[1] T. Kanamoto, Y. Ogasahara, K. Natsume, K. Yamaguchi, H. Amishiro, T. Watanabe, and M. Hashimoto, "Impact of Well Edge Proximity Effect on Timing," In Proc. IEEE European Solid-State Device Research Conference, pages 115-118, September 2007.